CAS: 24304-00-5
Einecs: 246-140-8
Chemical Reaction: Ain
Boiling Point: 2249ºC
Origin: China
Appearance: White or Gray White Powder
Applications
Aluminum nitride is used in optoelectronic engineering, including as an inductive layer in optical storage interfaces and electronic substrates, as a chip carrier with high thermal conductivity, and for military purposes.
Due to the properties of the piezoelectric effect of aluminum nitride, epitaxial stretching of aluminum nitride crystals is also used for surface acoustic wave detectors. The detectors are placed on silicon wafers. There are very few places where these thin films can be produced reliably.
Aluminum nitride ceramics have the characteristics of high room temperature and high temperature strength, small expansion coefficient and good thermal conductivity, and can be used as heat exchanger materials for high temperature structural parts.
Using aluminum nitride ceramics to resist the corrosion properties of iron, aluminum and other metals and alloys, it can be used as crucible and casting mold materials for smelting Al, Cu, Ag, Pb and other metals.
Features
1. Used to manufacture high performance ceramic products.
2. Used to manufacture integrated circuit substrates, electronics, optics, radiators, and high temperature crucibles.
3. High purity and sintering activity.
Specifications
Item | Unit | Performance Indicator Value |
Carbon | ppm | <400 |
Oxygen | % | <0.85 |
Specific Surface Area | m2/g | 2.0~2.4 |
D50 | μm | 1.3~1.8 |
Calcium | ppm | <250 |
Silicon | ppm | <15 |
Iron | ppm | <15 |
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